This 3 unit course is intended to introduce graduate students to state-of-the-art nanofabrication techniques and physical properties of magnetic nanostructures. Particular emphasis will be put on those techniques available on campus. First, various types of nanofabrication techniques, their capabilities and limitations in achieving magnetic nanostructures, will be discussed. Specifically, I will cover physical and chemical deposition (vacuum basics, sputtering, evaporation, MBE, pulsed laser deposition, electrodeposition) and nanopatterning techniques (photo- and e-beam lithography, x-ray lithography, laser interference lithography, scanning probe lithography, step growth methods, nanoimprint, shadow masks, radiation damage, self-assembled structures, and the use of nanotemplates).  Then I will review the common methods for structural, chemical, and magnetic characterizations (x-ray and electron diffraction, electron microscopy, EDX, SQUID, VSM, AGM).  Finally physical properties of these nanostructures will be discussed, including properties of single nanodots, magnetic interactions in arrays, magnetic behavior of nanostructured wires, magneto-transport phenomena, and properties of hybrid systems. Some lab demonstrations and/or experiments will be included.

  In-class handouts.
  Other reference books / reviews:               

                Thin Film Processes II, John Vossen & Werner Kern, Eds. Academic Press.
                Magnetic Nanostructures , Hari Singh Nalwa, American Scientific Publishers.
                Elements of X-ray Diffraction , B. D. Cullity & S. R. Stock, 3rd Ed., Prentice Hall.
                Thin Film Analysis by X-Ray Scattering, Mario Birkholz, Wiley-VCH.

"Ordered magnetic nanostructures: fabrication and properties", J. I. Martin, J. Nogues, Kai Liu, J. L. Vicent, and I. K. Schuller, topical review, J. Magn. Magn. Mater. 256, 443 (2003).

 

Schedule

(Subject to change)

                                    HW#1: Handout#1, problems 6.1-6.5, 10.1, 10.2, due 1/23;

                                    HW#2: Sputtering system pumping schematics & sequences, due 2/11;

                                   HW#3: Handout (2/13), Problems 30.4-30.8, due 2/27

Monday	Wednesday
1/7 Class Organization Introduction (1.8MB)	1/9 Vacuum Basics & Pumps (2.5MB)
1/14 Sputtering & Evaporation (2.2MB) Sputtering Process (Animation-AJA)	1/16 Chemical Deposition (0.4MB) Lithography (0.8MB) Nabity Lithography Online Semiconductor Fab Tour
1/21   MLK Holiday, no class	1/23   Lab Demo: Vacuum systems, Sputtering & Electrodeposition 216 Phy/Geo
1/28 Nanolithography I: E-beam, x-ray and Interference Lithography (2.8MB)	1/30 Nanolithography II: Scanning Probe, Step Growth, Nanoimprint, Shadow Mask (5.2MB)
2/4 Cleanroom tour & Lithography demo Kemper Hall Southwest End	2/6   No Class
2/11 Nanolithography III:  Self Assembly,   Nanotemplates (4.9MB)	2/13 X-ray (2.8MB)
2/18 Presidents Holiday, no class	2/20 Lab Demonstration: x-ray diffraction 214 Phy/Geo
2/25   Magnetic Basics Physical Properties	2/27  Magnetic Characterization Lab Demonstration: VSM, AGM, SQUID, MOKE, B-H looper
3/3 Student Presentations & Discussions