AES Microscopy System
This system is a commercial PHI 590 multitechnique instrument equipped with a scanning AES,
SEM and SIMS systems as well as a loadlock system for sample transfer. This UHV system is
capable of performing two classes of experiments: surface imaging and depth profiling.
Surface imaging can be performed using SEM or scanning AES depending on the type of information
that is desired. In both cases features with lateral dimensions of approximately 200nm can be
resolved. SEM images allow the surface topography to be determined, while scanning AES
measurements allow the chemical composition of the surface region to be mapped.
Depth profiling is accomplished by ion sputtering the sample and analyzing it using AES or SIMS.
In both experiments you generate a depth profile of chemical composition through the film.
While SIMS offers better sensitivity than AES it is much more difficult to quantitate. Thus
SIMS is primarily used for detecting low level impurities and dopants, while AES gives a better
ideal of the actual film composition.
This system is currently being used to investigate the topography of polymer surfaces and to
examine the depth profile of dopants and impurities in semiconductor samples.
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© Shirley Chiang - 1998.