This 3 unit course is intended to introduce graduate students to state-of-the-art nanofabrication techniques and physical properties of magnetic nanostructures. Particular emphasis will be put on those techniques available on campus. First, various types of nanofabrication techniques, their capabilities and limitations in achieving magnetic nanostructures, will be discussed. Specifically, I will cover physical and chemical deposition (vacuum basics, sputtering, evaporation, MBE, pulsed laser deposition, electrodeposition) and nanopatterning techniques (photo- and e-beam lithography, x-ray lithography, laser interference lithography, scanning probe lithography, step growth methods, nanoimprint, shadow masks, radiation damage, self-assembled structures, and the use of nanotemplates).  Then I will review the common methods for structural, chemical, and magnetic characterizations (x-ray and electron diffraction, electron microscopy, EDX, SQUID, VSM, AGM).  Physical properties of these nanostructures will be discussed, including properties of single nanodots, magnetic interactions in arrays, magnetic behavior of nanostructured wires, magneto-transport phenomena, and properties of hybrid systems. Some lab demonstrations and/or experiments will be included.

References

  In-class handouts.
  Other reference books / reviews:               

                     Thin Film Processes II, John Vossen & Werner Kern, Eds. Academic Press.
                     Magnetic Nanostructures , Hari Singh Nalwa, American Scientific Publishers.
                    Elements of X-ray Diffraction , B. D. Cullity & S. R. Stock, 3rd Ed., Prentice Hall.
                    Thin Film Analysis by X-Ray Scattering, Mario Birkholz, Wiley-VCH.

                         Materials Processing Handbook, Joanna R. Groza, James F. Shackelford, Enrique J. Lavernia, Michael T. Powers, CRC

"Ordered magnetic nanostructures: fabrication and properties", J. I. Martin, J. Nogues, Kai Liu, J. L. Vicent, and I. K. Schuller,

topical review, J. Magn. Magn. Mater. 256, 443 (2003).

Schedule

(Subject to change)

                        

Monday	Wednesday
4/2 Nanostructured Materials	4/4 Vacuum Basics
4/9 Vacuum Pumps	4/11 Sputtering Sputtering Process (Animation-AJA)
4/16 Evaporation & Chemical Deposition	4/18 Lab Demo: Vacuum systems, sputtering & electrodeposition 216 Physics
4/23 Lithography	4/25 Cleanroom tour & Lithography demo Center for Nano-MicroManufacturing  (Meet at 1209 Kemper Hall)
4/30 Nanolithography I: E-beam Lithography  Nabity Lithography	5/2 Nanolithography II: X-Ray, Interference, Scanning Probe & Step Growth
5/7  Nanolithography III: Nanoimprint, Shadow Mask, Self Assembly	5/9  Nanolithography IV: Nanotemplates
5/14 X-Ray	5/16   Lab Demo: X-ray diffraction 214 Physics
5/21 Magnetics	5/23   Lab Demo: Magnetic Characterizations 214 Physics
5/28 Memorial Day	5/30  No Class
6/4 Student Presentations (2hrs)	6/6 Student Presentations (2hrs)